Detailed Product Description

Continuous magnetron sputtering machine is mainly used in flat glass, acrylic, PC, PET surface plating high-quality, multi-function metal membrane, electromagnetic shielding film, the reaction film composite membrane, transparent conductive film, antireflection (AR), by reflex film, such as LOw-E coating .

  Equipment characteristics:
   1, a vacuum magnetron sputtering equipment, twin cathode, IF sputtering technology, and printed advanced control systems.
   2, the production process all automated, continuous. Plating workpiece temperature was up to 350 , adjustable temperature control district,
   3, vacuum chamber materials used SUS304, polishing a vacuum chamber wall with a wall spray polishing beads processing. 
   4, use magnetic drive to protect the stability of transmission. The entire production line of the paragraph using VVVF speed motor drive, adjustable speed 
   5 electrical control systems: membrane touch screen and PLC automatic control, man-machine dialogue to achieve the data show that the operation and control 
   6, main technical parameters: 
   7substrate-Size: 8 5 0 × 1 5 0 0 (mm) (can be customized on request) 
   8 uniformity of the film: ± 2% 
   9 the film Stability: meet international standards